7223. The effects of rapid thermal annealing on the properties of plasma enhanced chemically vapor-deposited silicon nitride: W D Brown and M A Khaliq,Thin Solid Films, 186, 1990, 73–85

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 153 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)91030-r