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The effect of diluent gas and rapid thermal annealing on the properties of plasma-deposited silicon nitride films

โœ Scribed by Chul Woo Nam; Seong Ihl Woo; Yong Tae Kim; Suk-Ki Min

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
621 KB
Volume
209
Category
Article
ISSN
0040-6090

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Effect of thermal annealing on the gas p
Effect of thermal annealing on the gas permeability of HIQ-40 films
โœ J. Y. Park; D. R. Paul; I. Haider; M. Jaffe ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 381 KB ๐Ÿ‘ 2 views

The copolyester formed from 40 mol% p-hydroxybenzoic acid (H), 30 mol% isophthalic acid (I), and 30 mol% hydroquinone (Q), designated as HIQ-40, forms isotropic, amorphous films when appropriately cast from a solvent. Thermal annealing leads to a mesogenic texture and some level of crystallinity. It