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Effects of slurry filter size on the chemical mechanical polishing (CMP) defect density

✍ Scribed by Yong-Jin Seo; Sang-Yong Kim; Yeon-Ok Choi; Yong-Taek Oh; Woo-Sun Lee


Book ID
116730334
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
626 KB
Volume
58
Category
Article
ISSN
0167-577X

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