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Effects of ozone as an oxygen source on the properties of the Al2O3 thin films prepared by atomic layer deposition

โœ Scribed by Jaebum Kim; Kuntal Chakrabarti; Jinho Lee; Ki-Young Oh; Chongmu Lee


Book ID
114193328
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
166 KB
Volume
78
Category
Article
ISSN
0254-0584

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Properties of Al2O3-films deposited on s
โœ Per Ericsson; Stefan Bengtsson; Jarmo Skarp ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 293 KB

A1203-films deposited by atomic layer epitaxy onto silicon wafers were investigated structurally and electrically. A post-deposition anneal at 900ยฐC resulted in a decrease in film thickness of about 10% and an increase in the index of refraction of about 3%. The densification did not significantly i