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Effects of oxygen radical on the properties of indium tin oxide thin films deposited at room temperature by oxygen ion beam assisted evaporation

✍ Scribed by J.S. Kim; J.W. Bae; H.J. Kim; N.-E. Lee; G.Y. Yeom; K.H. Oh

Book ID: 114085315
Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 241 KB
Volume: 377-378
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(00)01392-4

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