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Effects of oxygen partial pressure during deposition on the properties of ion-beam-sputtered indium-tin oxide thin films

✍ Scribed by Bregman, J.; Shapira, Yoram; Aharoni, H.

Book ID: 121508482
Publisher: American Institute of Physics
Year: 1990
Tongue: English
Weight: 526 KB
Volume: 67
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.345017

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