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Properties of ITO (Indium Tin Oxide) Film Deposited by Ion-Beam-Assisted Sputter

✍ Scribed by Lee, Sung Ho; Cho, Sang Hyun; Kim, Hyo Jin; Kim, Sung Hong; Lee, Sang Geul; Song, Kyu Ho; Song, Pung Keun

Book ID
126622382
Publisher
Taylor and Francis Group
Year
2012
Tongue
English
Weight
235 KB
Volume
564
Category
Article
ISSN
1542-1406

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Indium tin oxide thin films prepared by
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## Abstract Indium tin oxide (ITO) films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique (IBAD) at different ion beam currents (80–120 mA). The effect of the ion beam current on films properties has been studied. The films prepared at low ion

Preparation and characterization of indi
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Indium tin oxide (ITO) films were produced by low-energy oxygen ion beam assisted electron-beam evaporation. The dependence of surface morphology, electrical and optical properties on evaporation rate, oxygen ion beam energy and density, as well as substrate temperatures was characterized by atomic