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High-quality indium tin oxide films prepared at room temperature by oxygen ion beam assisted deposition

✍ Scribed by Liu, C; Matsutani, T; Yamamoto, N; Kiuchi, M

Book ID
120551311
Publisher
EDP Sciences
Year
2002
Tongue
English
Weight
157 KB
Volume
59
Category
Article
ISSN
0295-5075

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πŸ“œ SIMILAR VOLUMES

Indium tin oxide thin films prepared by
Indium tin oxide thin films prepared by ion beam assisted deposition technique at different ion beam currents
✍ Meng, Lijian ;Gao, Jinsong ;Teixeira, V. ;dos Santos, M. P. πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 664 KB

## Abstract Indium tin oxide (ITO) films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique (IBAD) at different ion beam currents (80–120 mA). The effect of the ion beam current on films properties has been studied. The films prepared at low ion

Preparation and characterization of indi
Preparation and characterization of indium tin oxide films formed by oxygen ion beam assisted deposition
✍ C. Liu; T. Mihara; T. Matsutani; T. Asanuma; M. Kiuchi πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 195 KB

Indium tin oxide (ITO) films were produced by low-energy oxygen ion beam assisted electron-beam evaporation. The dependence of surface morphology, electrical and optical properties on evaporation rate, oxygen ion beam energy and density, as well as substrate temperatures was characterized by atomic