## Abstract Titanium dioxide (TiO~2~) films are produced by inductively coupled plasma‐assisted (ICP) CVD at various H~2~ flow rates. Anatase and rutile TiO~2~ films are obtained without any external heating. The surface morphologies, structures, and deposition rates of the TiO~2~ films are strongl
✦ LIBER ✦
Effects of growth rate on the microcrystalline characteristics of plasma-deposited μc-Si:H
✍ Scribed by Seiichi Miyazaki; Yukio Osaka; Masataka Hirose
- Publisher
- Elsevier Science
- Year
- 1984
- Weight
- 445 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0165-1633
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