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Effects of DC Bias on the Microstructure, Residual Stress and Hardness Properties of TiVCrZrTaN Films by Reactive RF Magnetron Sputtering

✍ Scribed by Chao-Te Lee; Wen-Hao Cho; Ming-Hua Shiao; Chien-Nan Hsiao; Kuo-Sheng Tang; Cheng-Chung Jaing

No coin nor oath required. For personal study only.

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