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Effect of substrate temperature on the microstructure, optical, and electrical properties of reactive DC magnetron sputtering vanadium oxide films

โœ Scribed by Zhang, Dongping ;Huang, Rengui ;Zhang, Ting ;Li, Yan ;Chen, Youtong ;Zhong, Yonglin ;Fan, Ping ;Huang, Jianjun

Book ID
115561493
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
499 KB
Volume
209
Category
Article
ISSN
0031-8965

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Effect of substrate temperature on the structural, optical and electrical properties of dc magnetron sputtered tantalum oxide films
โœ S.V. Jagadeesh Chandra; S. Uthanna; G. Mohan Rao ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 669 KB

dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on quartz and silicon substrates by sputtering of pure tantalum target in the presence of oxygen and argon gases under various substrate temperatures in the range 303-973 K. The variation of cathode potent