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Effects of Ar gas pressure on microstructure of DLC films deposited by high-power pulsed magnetron sputtering

✍ Scribed by Nakao, Setsuo; Yukimura, Ken; Ogiso, Hisato; Nakano, Shizuka; Sonoda, Tsutomu

Book ID
118033788
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
516 KB
Volume
89
Category
Article
ISSN
0042-207X

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In this work thin silver (Ag) films are grown employing high power pulsed magnetron sputtering (HPPMS) for various pulse on/off time configurations, as well as by dc magnetron sputtering (dcMS), for reference. It is shown that the increase of the pulse off-time from 450 ΞΌs to 3450 ΞΌs, while the puls