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Titanium film deposition by high-power impulse magnetron sputtering: Influence of pulse duration

โœ Scribed by F.J. Jing; T.L. Yin; K. Yukimura; H. Sun; Y.X. Leng; N. Huang

Book ID
116965192
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
765 KB
Volume
86
Category
Article
ISSN
0042-207X

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