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Effect of the ion-energy loss rate on defect formation during implantation in silicon nanocrystals

✍ Scribed by G. A. Kachurin; S. G. Cherkova; D. V. Marin; A. K. Gutakovskiĭ; A. G. Cherkov; V. A. Volodin

No coin nor oath required. For personal study only.

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