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The effect of ion-implantation damage on dopant diffusion in silicon during shallow-junction formation

✍ Scribed by Yudong Kim; Hisham Z. Massoud; Richard B. Fair


Book ID
112815955
Publisher
Springer US
Year
1989
Tongue
English
Weight
835 KB
Volume
18
Category
Article
ISSN
0361-5235

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