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The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation

โœ Scribed by Jeonghee Cho; Seunghee Han; Yeonhee Lee; Ok Kyung Kim; Gon-Ho Kim; Young-Woo Kim; Hyuneui Lim


Book ID
108423065
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
203 KB
Volume
157
Category
Article
ISSN
0257-8972

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