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Effects of silicide formation on the removal of end-of-range ion implantation damage in silicon

✍ Scribed by W. Lur; J.Y. Cheng; C.H. Chu; M.H. Wang; T.C. Lee; Y.J. Wann; W.Y. Chao; L.J. Chen


Book ID
113280183
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
705 KB
Volume
39
Category
Article
ISSN
0168-583X

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