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Effect of substrate temperature on the structural properties of magnetron sputtered titanium nitride thin films with brush plated nickel interlayer on mild steel

✍ Scribed by B. Subramanian; K. Ashok; M. Jayachandran

Book ID
108063702
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
870 KB
Volume
255
Category
Article
ISSN
0169-4332

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dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on quartz and silicon substrates by sputtering of pure tantalum target in the presence of oxygen and argon gases under various substrate temperatures in the range 303-973 K. The variation of cathode potent