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Effect of the nature of the working gas on the d.c. magnetron sputter deposition of chromium nitride and oxi-nitride thin films on steel substrates

✍ Scribed by J. Baborowski; M. Charbonnier; M. Romand

Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
461 KB
Volume
80
Category
Article
ISSN
0257-8972

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Thin films of cubic boron nitride (c-BN) can be produced by various PVD and PECVD techniques under several prerequisites referring reportedly to the growth temperature, stoichiometry of the deposited films, and energy impact of the growing surface during film deposition. For reactive magnetron-sputt