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The Effect of Substrate Temperature on the Structure and Morphology of Titanium Nitride Compounds Grown by DC Magnetron Sputtering

✍ Scribed by M. R. Hantehzadeh; R. Bavadi; A. H. Sari; M. Ghoranneviss

Book ID
106412092
Publisher
Springer
Year
2011
Tongue
English
Weight
425 KB
Volume
30
Category
Article
ISSN
0164-0313

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dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on quartz and silicon substrates by sputtering of pure tantalum target in the presence of oxygen and argon gases under various substrate temperatures in the range 303-973 K. The variation of cathode potent