𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

✍ Scribed by Szymańska, Magdalena; Gierałtowska, Sylwia; Wachnicki, Łukasz; Grobelny, Marcin; Makowska, Katarzyna; Mroczyński, Robert

Book ID
121507461
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
615 KB
Volume
301
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Electrical and structural properties of
Electrical and structural properties of zirconia thin films prepared by reactive magnetron sputtering
✍ K.P.S.S. Hembram; Gargi Dutta; Umesh V. Waghmare; G. Mohan Rao 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 819 KB

Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp