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Effect of post-deposition annealing temperature on RF-sputtered HfO2 thin film for advanced CMOS technology

โœ Scribed by Khairnar, A.G.; Mahajan, A.M.


Book ID
122778560
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
714 KB
Volume
15
Category
Article
ISSN
1293-2558

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