Effect of Ni silicide density on electrical performance of silicide-induced crystallized polycrystalline silicon thin-film transistors

✍ Scribed by Chang Woo Byun, A. Mallikarjuna Reddy, Se Wan Son, Seung Ki Joo

• Book ID: 118303760
• Publisher: The Korean Institute of Metals and Materials
• Year: 2012
• Tongue: English
• Weight: 995 KB
• Volume: 8
• Category: Article
• ISSN: 1738-8090
• DOI: 10.1007/s13391-012-2112-0