Gettering of Ni silicide to minimize the leakage current in metal-induced crystallized polycrystalline silicon thin-film transistors

✍ Scribed by Chang Woo Byun, Se Wan Son, Yong Woo Lee, Hyun Mo Kang, Seol Ah Park, Woo Chang Lim, Tao Li, Seung Ki Joo

• Book ID: 113110954
• Publisher: The Korean Institute of Metals and Materials
• Year: 2012
• Tongue: English
• Weight: 650 KB
• Volume: 8
• Category: Article
• ISSN: 1738-8090
• DOI: 10.1007/s13391-012-2001-6