InN films have been grown by plasma-assisted molecular beam epitaxy (PAMBE) and characterized by various technologies. It was found that the structural, optical and electrical properties can be drastically improved by raising growth temperature from 440 to 525 1C. Grainy morphology was found in the
Effect of lower growth temperature on C incorporation in GeC epilayers on Si(0 0 1) grown by MBE
β Scribed by M. Okinaka; Y. Hamana; T. Tokuda; J. Ohta; M. Nunoshita
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 106 KB
- Volume
- 16
- Category
- Article
- ISSN
- 1386-9477
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