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Effect of Heavy Boron Doping on Oxygen Precipitation in Czochralski Silicon Substrates of Epitaxial Wafers

✍ Scribed by Sueoka, Koji; Akatsuka, Masanori; Yonemura, Mitsuharu; Ono, Toshiaki; Asayama, Eiichi; Katahama, Hisashi

Book ID
121801533
Publisher
The Electrochemical Society
Year
2000
Tongue
English
Weight
657 KB
Volume
147
Category
Article
ISSN
0013-4651

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