Effect of deposition pressure on microstructure and properties of hydrogenated carbon nitride films prepared by DC-RF-PECVD
โ Scribed by Junying Hao; Tao Xu; Weimin Liu
- Book ID
- 116668886
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 174 KB
- Volume
- 351
- Category
- Article
- ISSN
- 0022-3093
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
Carbon nitride (CN x /CN x ) multilayers with sequential sp 3 -rich and sp 2 -rich layers were deposited on c-Si substrate by direct current magnetron sputtering. The composition, microstructure and morphology of the films were investigated by the X-ray photoelectron spectroscopy and transmission el
Carbon nitride films (CN x films) were deposited on Si(1 0 0) substrates making use of dual direct current radio frequency (DC-RF) plasma enhanced chemical vapor deposition (PECVD), using a mixed gas of CH 4 and N 2 as the source gas. The microstructures, morphologies, and compositions of the result