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Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system

✍ Scribed by Junying Hao; Weimin Liu; Qunji Xue

Book ID: 116669877
Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 201 KB
Volume: 353
Category: Article
ISSN: 0022-3093
DOI: 10.1016/j.jnoncrysol.2006.10.008

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