Double-layer resist films for submicrometer electron-beam lithography
โ Scribed by Todokoro, Y.
- Book ID
- 114593480
- Publisher
- IEEE
- Year
- 1980
- Tongue
- English
- Weight
- 766 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0018-9383
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A very highly sensitive resist is difficult to simulate its resist profile because of its extreme difference of development rate which can be determined from absorbed energy when electron beam is exposed. We developed resist profile simulator named ELlS (Electron-beam Lithography Simulator) that can
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