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Doping characteristics of BF2+ implants in 〈100〉 and 〈111〉 silicon

✍ Scribed by Drobny, V.F.; Rubalcava, J.

Book ID: 114538775
Publisher: IEEE
Year: 2001
Tongue: English
Weight: 164 KB
Volume: 48
Category: Article
ISSN: 0018-9383
DOI: 10.1109/16.936586

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