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Diffusion of tellurium in silicon studied by the redistribution of an implanted source of radioactive 121Te

✍ Scribed by F. Rollert; N.A. Stolwijk; H. Mehrer

Book ID: 103954198
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 753 KB
Volume: 18
Category: Article
ISSN: 0921-5107
DOI: 10.1016/0921-5107(93)90121-3

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