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Diffusion length measurements of thin amorphous silicon layers

✍ Scribed by J.C. van den Heuvel; R.C. van Oort; M.J. Geerts


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
241 KB
Volume
69
Category
Article
ISSN
0038-1098

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Amorphous silicon, a-Si, thin films were prepared from SiH, by plasma glow discharge. Film characterization was accomplished using ir and -vfi optical measurements. Differences observed in the energy gap values, optically and photoelectrochemically determined, were correlated with the substrate temp