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Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides

✍ Scribed by Feliciano Giustino; Paolo Umari; Alfredo Pasquarello

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 205 KB
Volume: 72
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2004.01.011

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