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Silicate formation at the interface of Hf-oxide as a high-k dielectrics and Si(0 0 1) surfaces

✍ Scribed by D. Schmeißer; E. Zschech

No coin nor oath required. For personal study only.

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Silicate formation at the interface of Hf-oxide as a high-k dielectrics and Si(0&#xa0;0&#xa0;1) surfaces