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Development of a hollow cathode plasma source for microcrystalline silicon thin films deposition

✍ Scribed by Dimitrakellis, P; Amanatides, E; Mataras, D; Rapakoulias, D E

Book ID
121480982
Publisher
Institute of Physics
Year
2011
Tongue
English
Weight
369 KB
Volume
275
Category
Article
ISSN
1742-6588

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