In situ physical vapor deposition of ionized Ti and TiN thin films using hollow cathode magnetron plasma source

✍ Scribed by D’Couto, G. C.; Tkach, G.; Ashtiani, K. A.; Hartsough, L.; Kim, E.; Mulpuri, R.; Lee, D. B.; Levy, K.; Fissel, M.; Choi, S.; Choi, S.-M.; Lee, H.-D.; Kang, H.-K.

• Book ID: 121657409
• Publisher: AVS (American Vacuum Society)
• Year: 2001
• Tongue: English
• Weight: 526 KB
• Volume: 19
• Category: Article
• ISSN: 0734-211X
• DOI: 10.1116/1.1339012