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Determination of the deposition rate of DC magnetron sputtering in fabrication of X-ray supermirrors

โœ Scribed by Fengli Wang; Zhanshan Wang; Jingtao Zhu; Zhong Zhang; Wenjuan Wu; Shumin Zhang; Lingyan Chen

Book ID
115367651
Publisher
Optics InfoBase
Year
2006
Tongue
English
Weight
164 KB
Volume
4
Category
Article
ISSN
1671-7694

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The dependence of deposition rate on pow
The dependence of deposition rate on power input for dc and rf magnetron sputtering
โœ AR Nyaiesh; L Holland ๐Ÿ“‚ Article ๐Ÿ“… 1981 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 264 KB

An earlier study of the magnetron sputtering of copper in this laboratory has shown that the growth rate in Ar for a dc magnetron is almost twice that for an rf system with an identical target, operated at the same indicated power input. Experiments have been made to find whether the difference in t