𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina

✍ Scribed by N.D. Madsen; B.H. Christensen; S. Louring; A.N. Berthelsen; K.P. Almtoft; L.P. Nielsen; J. Bøttiger

Book ID
116893320
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
836 KB
Volume
206
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Process stabilization and enhancement of
Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide
✍ K. Sarakinos; J. Alami; C. Klever; M. Wuttig 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 337 KB

Reactive high power pulsed magnetron sputtering (HPPMS) of zirconium oxide exhibits a stable and hysteresis-free transition zone, as opposed to reactive direct current magnetron sputtering (dcMS). The stabilization of the transition zone in HPPMS facilitates the growth of transparent zirconium oxide

A novel pulsing method for the enhanceme
A novel pulsing method for the enhancement of the deposition rate in high power pulsed magnetron sputtering
✍ Jung-Hwan In; Sang-Hun Seo; Hong-Young Chang 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 513 KB

A novel pulsing technique has been proposed to enhance the deposition rate of film in high power pulsed magnetron sputtering (HPPMS). The detailed investigations on the temporal behavior of the plasma density have been done. The results have provided a clue to it: a temporal discrepancy between the