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Effect of DC bias on the deposition rate using RF-DC coupled magnetron sputtering for Mg thin films

โœ Scribed by T. Tanaka; M. Suzuki; K. Kawabata

Book ID
114086637
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
232 KB
Volume
343-344
Category
Article
ISSN
0040-6090

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