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Preparation of argon-free refractory thin films using RF-DC coupled magnetron sputtering

โœ Scribed by P.K. Petrov; E.K. Hollmann; V.A. Volpyas; A.V. Volpyas; T. Tanaka; K. Kawabata

Book ID
108390506
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
171 KB
Volume
53
Category
Article
ISSN
0042-207X

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Monte Carlo simulation of argon atoms tr
Monte Carlo simulation of argon atoms transport during deposition of W thin films by RF-dc coupled magnetron sputtering
โœ PK Petrov; VA Volpyas; EK Hollmann; T Tanaka; K Kawabata ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 205 KB

## RFpower and DC bias have been simultaneously applied to the target in a conventional magnetron sputtering system in order to control the growth kinetics of W thin films using argon gas for sputtering. A Monte Carlo simulation based on physical models of ion-plasma sputtering was carried out to st