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Optimisation of the hydrogen content in a-Si:H deposited at high rate by dc magnetron sputtering

✍ Scribed by N. Beldi; J. Sib; L. Chahed; T. Smaïl; T. Mohammed-Brahim; Z. Djebbour; J.P. Kleider; C. Longeaud; D. Mencaraglia

Book ID: 115989004
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 256 KB
Volume: 164-166
Category: Article
ISSN: 0022-3093
DOI: 10.1016/0022-3093(93)90552-9

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