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Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures

✍ Scribed by Ait Aissa, K.; Achour, A.; Camus, J.; Le Brizoual, L.; Jouan, P.-Y.; Djouadi, M.-A.

Book ID
121413386
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
987 KB
Volume
550
Category
Article
ISSN
0040-6090

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