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Deposition temperature determination of HDPCVD silicon dioxide films

✍ Scribed by G. Gulleri; C. Carpanese; C. Cascarano; D. Lodi; R. Ninni; G. Ottaviani

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 386 KB
Volume: 82
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2005.07.079

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