Deposition of silicon nitride thin films by hot-wire CVD at 100 °C and 250 °C

✍ Scribed by P. Alpuim; L.M. Gonçalves; E.S. Marins; T.M.R. Viseu; S. Ferdov; J.E. Bourée

• Book ID: 108290372
• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 509 KB
• Volume: 517
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2009.01.077