Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD

✍ Scribed by J.E. Bourée; J. Guillet; C. Grattepain; J. Chaumont

• Book ID: 108388612
• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 318 KB
• Volume: 430
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/s0040-6090(03)00086-5