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Deposition of silica films by the oxidation of silane in oxygen II: The calculation of growth rates in the tube reactor

✍ Scribed by Ya.V. Vasiliev; L.L. Vasilieva; V.N. Droznov; A.A. Shklyaev

Publisher
Elsevier Science
Year
1981
Tongue
English
Weight
387 KB
Volume
76
Category
Article
ISSN
0040-6090

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