๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Anisotropy in the growth rates of silicon deposited by reduction of silicon tetrachloride

โœ Scribed by J. Nishizawa; Y. Kato; M. Shimbo


Publisher
Elsevier Science
Year
1975
Tongue
English
Weight
713 KB
Volume
31
Category
Article
ISSN
0022-0248

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


A new method for the estimation of silic
โœ Emblem, H. G. ;Davy, V. P. ๐Ÿ“‚ Article ๐Ÿ“… 1950 ๐Ÿ› Wiley (John Wiley & Sons) โš– 168 KB ๐Ÿ‘ 1 views

## Abstract A new method has been devised for the estimation of silicon in silicon tetrachloride. It is based on a quantitative esterification with absolute ethyl alcohol, the silicon content of the resulting ester being estimated.