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Enhancement of the deposition rate of amorphous silicon by the application of magnetic fields

✍ Scribed by H. Watanabe; H. Warashina; T. Nagashima

Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 98 KB
Volume: 129
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(85)90063-x

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