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Deposition of silica films by the oxidation of silane in oxygen: I: The kinetics and physicochemical model of the process

✍ Scribed by L.L. Vasilyeva; V.N. Drozdov; S.M. Repinsky; K.K. Svitashev

Publisher
Elsevier Science
Year
1978
Tongue
English
Weight
426 KB
Volume
55
Category
Article
ISSN
0040-6090

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The kinetics of the reaction between nitric oxide and chlorine have been investigated in both carbon tetrachloride and glacial acetic acid. The nitric oxide-oxygen reaction has been investigated in carbon tetrachloride. The appearance of product, NOCl or NO,, was monitored spectrophotometrically a