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Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering

✍ Scribed by Stranak, Vitezslav; Herrendorf, Ann-Pierra; Wulff, Harm; Drache, Steffen; Cada, Martin; Hubicka, Zdenek; Tichy, Milan; Hippler, Rainer

No coin nor oath required. For personal study only.

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